Water is the "blood" of industry and plays an important role in manufacturing, processing, purification, and washing. Therefore, the quality of water is particularly important for industry. With the high-quality development of industry, the requirements for water quality in industrial production are becoming increasingly stringent. Many industries cannot do without ultrapure water. For example, the pharmaceutical industry uses ultrapure water for disinfection and cleaning, formulation bottle washing, and ingredient preparation, the power industry uses ultrapure water to prepare fine processing equipment, and the semiconductor industry uses ultrapure water to "bathe" and clean chips to ensure chip quality meets standards.

Semiconductors at the top of the entire electronic information industry chain are increasingly demanding the conductivity, ion content, TOC, DO, and other properties of ultrapure water. Strict requirements and complex preparation processes have brought high entry barriers to the semiconductor ultra-pure water preparation industry, and also created development opportunities for some enterprises with core self-developed advantages.

Different industries have different standards for ultra pure water, with semiconductors ranking as the "most high-end"

Pure water produced and treated with ultra-pure water equipment can be applied in fields such as electronic semiconductor industry, battery electroplating, food industry, glass water, medical industry, beverage water, brewing industry, production of ultra-pure materials and reagents. Different industries have set up different "admission vouchers" for ultrapure water.

At present, the Ministry of Electronic Industry of China divides industrial ultra pure water quality technology into five industry standards, namely 18M Ω. cm, 15M Ω. cm, 10M Ω. cm, 2M Ω. cm, and 0.5M Ω. cm, to distinguish different water qualities. Some industries not only have requirements for electrical resistivity, but also have strict requirements for metal ions, bacterial content, and even dissolved oxygen content.

Among them, the special requirement for boiler water in the power industry is ultra pure water>5M Ω· CM. Impurity of water can cause boiler fouling, consume heat energy, and uneven heating at the bottom of the boiler, which can also cause explosions. The water quality standards for ultra pure water in the pharmaceutical industry are: resistivity: ≥ 15M Ω · CM, conductivity: ≤ 0.5 μ S. Ammonia ≤ 0.3 μ G/ml, nitrate ≤ 0.06 μ G/ml, heavy metal ≤ 0.5 μ The water quality standard for rinsing coated glass with ultrapure water is: before coating, ultrapure water>17M Ω · CM should be used for cleaning. If the water quality does not meet the standard, it will lead to poor coating effect and easy detachment of the film layer.

The semiconductor industry has higher requirements for ultra-pure water indicators than other industries. Water quality requirements vary depending on the size and wire diameter of semiconductor chips. The water quality indicators of its ultrapure water are as follows: the resistivity is greater than 18.2 megaohms (25 degrees Celsius); TOC (Total organic carbon) is less than 1-10 ppb, DO (dissolved oxygen) is less than 1-10 ppb; 0.05 micron particles (particles) less than 200 per liter; The ion content is mostly less than 20 to 50 PPT, and no bacteria were detected.

In the production process of ultrapure water, any slight difference in particle size, resistivity, and TOC with a certain indicator in the bubble will lead to a decrease in the qualification rate of semiconductor component production. For example, in semiconductor production processes, boron is a P-type impurity, and excessive boron can cause n-type silicon to reverse, affecting electron and hole concentrations. Therefore, in the ultra-pure water industry, it is necessary to fully consider the removal of boron.

High standards of semiconductor ultrapure water promote the continuous improvement of ultrapure water preparation technology

The higher the requirements for the indicators of ultrapure water, the more complex the preparation process behind it, and the stricter the requirements for ultrapure water systems.

Therefore, the preparation technology of ultrapure water is a very important link in the development of the semiconductor industry. In recent years, semiconductor devices have become increasingly small. As semiconductor processes move from 28nm to 7nm, 5nm, and more advanced levels, advanced processes become more sensitive to impurities, making efficient cleaning of small-sized pollutants more difficult. This means that the preparation process of ultrapure water will be more important and challenging. At the same time, it is even more important for enterprises to have the ability to continuously innovate and continuously improve the technology and process of ultra pure water preparation.

Generally, ultrapure water systems require multiple processes such as filtration, ion exchange, degassing, reverse osmosis, ultraviolet radiation, ultrafiltration, nanofiltration, and ion adsorption filtration to produce ultrapure water. The process technology used throughout the manufacturing process is complex and precise, and cannot be deviated from. The semiconductor industry has very strict requirements for the resistivity of ultrapure water, with a resistivity greater than 18.2M Ω • cm, which theoretically contains almost no ions. Conventional single processes are difficult to meet this requirement. Multiple processes are commonly used in combination, such as resin+RO+EDI, etc. The ion content of tap water varies from place to place, and the process combination needs to be adjusted according to different situations. After removing the particles, the desalination process can be carried out.

In terms of degassing process, in recent years, the semiconductor industry has required dissolved oxygen (DO) to be less than 1 ppb, so removing dissolved oxygen from water is a technical challenge. While removing, it is also necessary to ensure air isolation, and the airtightness requirements for containers and pipelines are very strict. Usually, it is necessary to operate through a combination of multi-level high-performance degassing membranes to meet the deep degassing requirements of ultra pure water in the semiconductor industry.

The production technology of ultrapure water used in semiconductors is difficult, with high technical barriers and raw material barriers. Some essential key materials or products have to rely on imports.

Mastering the core ultra pure water technology, high-frequency technology brings breakthroughs in "core"

Affected by the development of the semiconductor industry, the demand for ultra pure water in China continues to rise, and the market has huge development space. After years of development, some domestic enterprises have achieved the production of equipment or core materials, gradually realizing the localization of ultra-pure water, and the production technology and process of ultra-pure water are becoming increasingly mature.

High frequency technology has been dedicated to the field of ultra-pure water for more than 20 years, guided by innovative research and development, continuously exploring the absolute purity of ultra-pure water. From multi-media filtration, activated carbon adsorption, ion exchange, reverse osmosis membrane, ultraviolet sterilization, ultraviolet TOC removal, to electrodialysis, ultrafiltration, sodium filtration, vacuum degassing tower, membrane degassing, etc., it covers more than 18 professional treatment processes, and constantly improves the application efficiency of the ultra pure water system. And it has also achieved industry-wide innovation in key technology product materials such as reverse osmosis, ion exchange, membrane degassing, ultraviolet sterilization, and TOC degradation. The water quality of the produced water is close to absolute purity, and the conductivity is infinitely close to the theoretical limit value of 18.24M Ω • cm. Its purity can reach 99.99999999999%, continuously meeting the increasing water demand of the semiconductor industry, and thus shaping a strong industry technical barrier, which has accumulated and developed in the domestic ultra pure process field.

In addition to understanding the process and understanding how to produce ultra pure water that meets the requirements of process indicators, maintaining system stability is also crucial for chip manufacturing. This is not only related to the selection of terminal materials and specifications, optimization of system pipeline design, but also related to the control system of ultra pure water devices. High frequency technology has certain advantages in the above aspects.

As a leading local ultra pure process technology enterprise in the industry, high-frequency technology has reached international advanced levels in terms of mastering ultra pure water processes and quality control in production and manufacturing processes. In the upstream field of research and production of ultra-pure water materials, the research and development prospects of high-frequency technology are also worth looking forward to.

In recent years, with the advantages of huge market demand, stable economic growth, and favorable industrial policy environment, China's semiconductor industry has entered a new stage of accelerated development. In recent years, the annual compound growth rate has reached 12%, and the market size has exceeded one trillion yuan. The rapid development of the semiconductor industry is also driving the continuous innovation of the ultra pure water industry. The progress in ultra pure water technology and processes achieved by high-frequency technology and other enterprises through independent innovation has also brought new empowerment to the domestic semiconductor industry for breakthroughs and upgrades.